Chapter
Apr 26, 2012
Improved Material Properties of Complex Oxide Thin Films for Application in Phased Array Antennas
Authors: M. W. Cole [email protected], E. Ngo, A. Podpirka, S. Ramanathan [email protected], M. Ivill, R. C. Toonen, S. G. Hirsch, and C. HubbardAuthor Affiliations
Publication: Earth and Space 2010: Engineering, Science, Construction, and Operations in Challenging Environments
Abstract
Ba0.60Sr0.40TiO3 (BST) thin films, grown via RF-sputtering and the metalorganic solution deposition (MOSD) techniques, were post-growth annealed via conventional thermal annealing (CTA) and UV-photon irradiation annealing. With respect to the conventional thermal annealed films the UV-photon irradiation annealed films possessed improved structural properties and dielectric response. The optimization of the UV-photon irradiation annealing process parameters was achieved via a detailed set of isothermal-isotemporal annealing experiments. The optimized UV-process parameters, applied to MOSD and RF sputtered BST films revealed enhanced structural materials response, i.e., a reduction in lattice parameter with extended UV-annealing time up to 225 min. The improvements in the material properties of the UV-photon irradiation annealed BST thin films are attributed to the mitigation of film of stress, hence reduction in oxygen vacancies via the UV-photon irradiation annealing process.
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© 2010 American Society of Civil Engineers.
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Published online: Apr 26, 2012
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U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005. E-mail: [email protected]
E. Ngo
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
A. Podpirka
School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138
School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138. E-mail: [email protected]
M. Ivill
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
R. C. Toonen
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
S. G. Hirsch
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
C. Hubbard
U.S. Army Research Laboratory, Weapons and Materials Research Directorate, Aberdeen Proving Ground, MD 21005
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