TECHNICAL PAPERS
Jan 14, 2011

Application of the Nitritation and Anammox Process into Inorganic Nitrogenous Wastewater from Semiconductor Factory

Publication: Journal of Environmental Engineering
Volume 137, Issue 2

Abstract

The first full-scale nitritation and anaerobic ammonium oxidation (Anammox) processes for an inorganic wastewater of semiconductor factory were installed and performances were evaluated. Existing facilities of conventional nitrification and denitrification were retrofitted to a combination of the nitritation and Anammox process. Novel nitritation method, selective acceleration of ammonia oxidation by high concentration of inorganic carbon, was evaluated in full-scale aeration tank with carrier material. The ammonia conversion rate of the nitritation reactor was in the range of 0.270.48kgNO2-N/m3day after start-up period, and stable nitritation was achieved for over 10 months. In an Anammox reactor, on-site cultivation of anammox bacteria was performed, and the most plausible reason for slower nitrogen conversion at the beginning was oxygen contamination into the reactor. After minimizing influence of oxygen contamination, design loading was achieved within 3 months of operation. After start-up period, stable Anammox reactions are maintained for over 10 months. The nitrogen removal rate after start-up period was in the range of 1.043.29kgN/m3day . In combination with conventional denitrification process, soluble nitrogen in the final effluent was reduced below 8 mg/L.

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Information

Published In

Go to Journal of Environmental Engineering
Journal of Environmental Engineering
Volume 137Issue 2February 2011
Pages: 146 - 154

History

Received: May 1, 2009
Accepted: Jul 6, 2010
Published online: Jan 14, 2011
Published in print: Feb 2011

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Authors

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Takaaki Tokutomi [email protected]
Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan (corresponding author). E-mail: [email protected]
Hideyo Yamauchi
Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan.
Sosuke Nishimura
Chief Researcher, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan.
Motoyuki Yoda
General Manager of R&D Division, Kurita Water Industries Ltd., 1-1 Gochoyama, Kawada, Nogi-machi, Shimotsuga-gun, Tochigi 329-0105, Japan.
Wiebe Abma
Senior Researcher, Paques BV, P.O. Box 52, 8560 AB Balk, The Netherlands.

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