Hydrofluoric Acid Recovery from Waste Semiconductor Acid Solution by Ion Exchange
Publication: Journal of Environmental Engineering
Volume 129, Issue 5
Abstract
Recovery of hydrofluoric acid (HF) from waste semiconductor acid solution by ion exchange was investigated. Strong base anionic and strong acid cationic ion exchange resins were involved in the recovery process. The former was used to capture the fluoride in the waste acid solution while the latter was employed for exchanging hydrogen ion for sodium in the NaF solution resulting from regeneration of the anion exchanger with NaOH. The ion exchange process consisted of two ion exchange steps and two regeneration steps. Batch experiments were conducted to determine the equilibrium ion exchange capacities and to develop ion exchange isotherms. Column tests were made to examine the performances of continuous ion exchange operations under conditions of different feed flow rates and inlet acid concentrations. A simplified model based on the general logistic function was adopted and tested for describing the solute breakthrough behaviors of the exit aqueous solution. Regeneration of exhausted ion exchange resins was also examined to test their effectiveness for repeated use. The hydrofluoric acid recovered by the ion exchange process would be available for reuse. It could also be converted by calcium chloride to high-purity calcium fluoride.
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Information & Authors
Information
Published In
Journal of Environmental Engineering
Volume 129 • Issue 5 • May 2003
Pages: 472 - 478
Copyright
Copyright © 2003 American Society of Civil Engineers.
History
Received: Nov 14, 2001
Accepted: Aug 1, 2002
Published online: Apr 15, 2003
Published in print: May 2003
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